分子束外延InAs量子点材料的透射电子显微镜研究
Study of Molecular Beam Epitaxy InAs Multilayers Dots by TEM
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摘要: 报道了利用分子束外延技术在(001)GaAs衬底上生长的单层及多层InAs量子点材料的透射电子显微镜(TEM)研究结果,并对量子点的结构特性进行了讨论.结果表明:多层量子点呈现明显的垂直成串排列趋势;随着InAs量子点层数的增加,量子点的密度下降,其尺寸随层数的增加趋向均匀.在试验条件下,5层量子点材料的InAs量子点厚度和GaAs隔离层的厚度的选择都比较合理,其生长过程中的应变场更有利于自组织量子的形成.Abstract: Single-and Multi-layer InAs quantum dots grown on (001) GaAs substrates by molecular beam epitaxy (MBE) were studied by transmission electron diffraction (TEM) and the structural properties of the quantum dots were discussed. The results indicated that multi-layer quantum dots are aligned vertically, in addition, the density of the dots decreases and the size of dots becomes uniform when the number of layers increases.In this experiments, the thickness of InAs dots sheets and GaAs space layers in samples with five dots sheets are the best condition to form the strain field needed by growth of self-organized quantum dots.