TiCl4-NH3-H2体系低温化学气相沉积TiN的机理和条件

TiCl₄-NH₃-H₂体系低温化学气相沉积TiN的机理和条件

摘要: 在TiCl₄-NH₃-H₂体系中,TiN的沉积温度通常在650-950℃,本研究采用TiCl₄+H₂与NH₃+H₂两种混和气体,可使TiN的沉积温度降低到500℃。所得TiN的硬度HV_0.1=17.67kN·m m^-2、a=0.4234nm,550℃时硬度HV_0.1=18.91kN·mm^-2,580℃ HV_0.1=20.36kN·mm^-2,而其颜色则依次由紫黄变为黄色。350℃部生成TiNCl。TiNCl在402℃开始分解,到800℃分解完毕,其分解反应的表观活化能为131kJ/mol。TiN生成反应表现活比能为67.3kJ/mol。

Abstract: This papar presented a study of low temperature chemical vapour deposition of TiN in TiCl₄-NH₃-H₂ system. TiN was obtained at the temperature of 500℃. Its hardness HV_0.1 = 17.67kN/mm², and lattice constant a=0.4234nm.The Surface reaction activation energy of TiN was 67.3kJ /mol. Decomposition of TiNCl, from which TiN was produced, was also studied. The activation energy of this reaction was 131kJ/mol.